Patterning is a crucial fabrication step for successfully applying two-dimensional materials in electronic and optoelectronic devices. It can realize miniaturization and help explore new physical phenomena of 2D materials. However, the manufacturing process inevitably introduces defects, which require harsh conditions to recover. Here, we propose a sputtering-lithography-annealing (SLA) strategy for patterning graphene nanofilm with pattern sizes ranging from microns to 100 nm scale without lattice damage. The sputtered masking agents can introduce easily repairable defects into graphene films. Especially, defects introduced by aluminum can be removed entirely. To confirm the validity of the SLA strategy, we prepared macro-assembled graphene nanofilms (nMAG)/Ge and nMAG/Si heterojunction arrays for infrared detection. The patterned detectors present a responsivity of 0.09 A/W at 2 μm (nMAG/Ge) and 26.4 mA/W at 1550 nm (nMAG/Si) with a high array homogeneity, similar to the devices without patterning. This strategy lays the foundation for further exploration of new superstructures of nMAG and can be extended to other 2D materials.
Recoverable Patterning of Macro-assembled Graphene Nanofilms
Prof. Yang Xu is an IEEE NTC Distinguished Lecturer, Fellow of the Institute of Physics (FInstP), Fellow of Royal Society of Chemistry (FRSC), Fellow of the Institute of Materials, Minerals and Mining (FIMMM),Fellow of International Association of Advanced Materials (FIAAM), and IEEE Senior Member of the Electron Devices Society. He received his B.S. degree in Institute of Microelectronics at Department of ECE from Tsinghua University, M.S. and Ph.D. degrees in ECE from the University of Illinois Urbana-Champaign (UIUC), USA. He is now a full professor at the School of Micro-Nano Electronics, Zhejiang University, China. He was also a visiting by-Fellow of Churchill College at the University of Cambridge, UK, and a visiting professor at the University of California Los Angles (UCLA). He has published more than 120 papers including Nature Nanotechnology, Nature Electronics, Nature Photonics, Chemical Reviews, Advanced Materials, Chemical Society Reviews, Nature Communications, Nano Letters, ACS Nano, and IEDM,etc. He holds over 30 granted patents and gave more than 50 talks in international conferences. He is also served as Associate Editor of IEEE T-ED, Photonics Research, and IEEE Nanotechnology Magazine, Editorial board member of IOP Nanotechnology, Microelectronics Journal, Micro & Nano Letters, and IET Circuits, Devices & Systems, Advisory Panel Member of IOP Nanotechnology, and was TPC committee members of IEEE-EDTM, IEEE-IPFA, and IEEE-EDAPS conferences. His research interests include emerging 2D/3D integrated optoelectronic devices for Internet-of-Things and Post-Moore Ubiquitous Electronics.
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