Electron Redistribution by Fluorine‑Induced Dual Defects in Cu3P Accelerated Charge Transfer Toward High‑Performance Electrochemical Chloride Ion Removal

Published in Chemistry and Materials

Electron Redistribution by Fluorine‑Induced Dual Defects in Cu3P Accelerated Charge Transfer Toward High‑Performance Electrochemical Chloride Ion Removal
Like

Share this post

Choose a social network to share with, or copy the URL to share elsewhere

This is a representation of how your post may appear on social media. The actual post will vary between social networks

Explore the Research

Springer Nature Singapore
Springer Nature Singapore Springer Nature Singapore

Electron Redistribution by Fluorine-Induced Dual Defects in Cu3P Accelerated Charge Transfer Toward High-Performance Electrochemical Chloride Ion Removal - Nano-Micro Letters

Electrochemical chloride ion removal is essential for clean water and environmental protection, yet its practical application is hindered by the sluggish kinetics, especially using high-mass-loading electrodes. Conventional extrinsic modifications, such as conductive additives or structural design, exhibit constrained effectiveness. Here, we report an intrinsic enhancement strategy through heteroatom doping-induced dual defects engineering, demonstrated by the successful synthesis of fluorine-doped copper(I) phosphide with phosphorus vacancies (F-Cu3PV) via molten salt treatment. Based on density functional theory calculations and experimental results, F doping caused lattice distortion, generating P vacancies to form dual defects. These defects effectively modulated intrinsic electron redistribution, resulting in improved electrical conductivity, enhanced adsorption capability, and reduced chloride ion diffusion energy barriers. Therefore, electron transfer and ion diffusion kinetics were significantly accelerated, leading to superior electrochemical performance. Resultantly, the F-Cu3PV electrode performed exceptional electrochemical chloride ion removal performance with superior areal deionization capacity (3.16 ± 0.02 mg cm−2) and a remarkably rapid areal deionization rate (0.106 ± 0.001 mg cm−2 min−1), as well as outstanding cycling stability (95.65% retention after 70 cycles). This work elucidates electron redistribution via heteroatom doping-induced dual defects as a viable pathway to overcome the intrinsic kinetic bottleneck for high-performance electrochemical chloride ion removal.

As global freshwater scarcity intensifies and industrial wastewater treatment demands escalate, electrochemical chloride ion removal has emerged as a critical technology for clean water production and environmental protection. Yet its practical deployment has been fundamentally hindered by sluggish reaction kinetics — particularly when scaling to high-mass-loading electrodes (>10 mg cm⁻²) required for commercial viability. Conventional extrinsic strategies, such as conductive additives or structural engineering, offer only constrained effectiveness because they fail to circumvent the intrinsic material limitations. Now, researchers from Tongji University, Kashi University, and Shanghai Ocean University, led by Prof. Jie Ma, have unveiled a transformative intrinsic enhancement strategy that redefines the performance ceiling of electrochemical deionization.

Why This Electrode Matters

Traditional approaches to accelerating electrode kinetics rely on extrinsic modifications — adding conductive components or engineering pore structures — which inevitably reach diminishing returns. The novel F-Cu3Pv electrode breaks through this bottleneck by leveraging heteroatom doping to trigger self-adaptive dual defect formation, fundamentally rewiring the intrinsic electronic structure of copper(I) phosphide. This intrinsic strategy achieves what extrinsic methods cannot: simultaneous enhancement of electron transfer, ion adsorption, and diffusion kinetics through controlled electron redistribution at the atomic level.

Innovative Design and Mechanism

The material is synthesized through a facile two-step route: low-temperature phosphation of Cu(OH)2 nanowire arrays followed by controlled molten salt treatment with NH4F. Density functional theory (DFT) calculations reveal the elegant mechanism:

  • F doping (electronegativity: 3.98) induces lattice distortion and surface reconstruction, reducing phosphorus vacancy formation energy from 1.21 eV to 0.63 eV
  • Dual defects (F doping + P vacancies) synergistically modulate intrinsic electron redistribution, as confirmed by Bader charge analysis and density of states calculations
  • Enhanced conductivity: The F-Cu3Pv model exhibits markedly increased electronic states near the Fermi level, accelerating intrinsic charge-transfer kinetics
  • Optimized Cl⁻ capture: Electron redistribution strengthens Cl⁻ adsorption (charge transfer: 0.83e vs. 0.56e for pristine Cu3P) and lowers diffusion energy barriers (0.38 eV vs. 0.48 eV)

HRTEM, EPR, and XPS analyses confirm the successful incorporation of F atoms and the generation of rich P vacancies, with lattice expansion and maintained nanorod array morphology.

Outstanding Performance

The F-Cu3Pv-2 electrode delivers exceptional electrochemical chloride ion removal metrics that surpass state-of-the-art counterparts:

  • Superior areal deionization capacity (ADC): 3.16 ± 0.02 mg cm-2 — more than doubling that of pristine Cu₃P
  • Ultrafast areal deionization rate (ADR): 0.106 ± 0.001 mg cm-2 min-1, achieving comparable salt removal in less than half the time
  • Outstanding cycling stability: 95.65% capacity retention after 70 cycles, compared to 86.67% for pristine Cu₃P
  • Energy-efficient operation: Lower energy consumption across all applied voltages (1.0–1.6 V), with competitive performance against previously reported electrodes

In Ragone plots and Kim-Yoon comparisons, F-Cu3Pv -2 stands distinctly apart from other Faradaic materials, Ag-based electrodes, and carbon materials, occupying the optimal region of high ADC and rapid ADR simultaneously.

High-Mass-Loading Practicality

Critically, the F-Cu3Pv electrode achieves an exceptional balance of areal, volumetric, and gravimetric deionization capacities — a trilemma that typically plagues high-mass-loading electrodes. Radar plot analysis confirms that F-Cu3Pv-2 simultaneously delivers the highest ADC, VDC, and GDC among comparable high-loading electrodes, attributed to the intrinsic kinetic enhancement that mitigates the sluggish transport associated with increased electrode thickness.

Applications and Future Outlook

This work establishes heteroatom doping-induced dual defects as a viable and generalizable pathway to overcome intrinsic kinetic bottlenecks in Faradaic electrode materials. By demonstrating that controlled electron redistribution through F doping and P vacancies can concurrently optimize conductivity, adsorption, and ion diffusion, this research opens promising avenues for next-generation electrochemical water treatment systems combining ultrafast desalination, high capacity, and long-term durability.

Stay tuned for more groundbreaking research from this collaborative team at Tongji University, Kashi University, and Shanghai Ocean University!

Please sign in or register for FREE

If you are a registered user on Research Communities by Springer Nature, please sign in